Low dose hard x-ray contact microscopy assisted by a photoelectric conversion layer
Hard x-ray contact microscopy provides images of dense samples at resolutions of tens of nanometers. However, the required beam intensity can only be delivered by synchrotron sources. We report on the use of a gold photoelectric conversion layer to lower the exposure dose by a factor of 40 to 50, al...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2013-04-01
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| Series: | AIP Advances |
| Online Access: | http://link.aip.org/link/doi/10.1063/1.4802886 |