Superhydrophobic silicon fabricated by phosphomolybdic acid-assisted electrochemical etching
Controllable geometry silicon surfaces with superhydrophobicity are difficult to be fabricated without photolithography techniques. Superhydrophobic silicon surfaces with water contact angle larger than 150º and sliding angle less than 10º have been successfully fabricated by electrochemical etching...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Sociedade Brasileira de Química
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| Series: | Química Nova |
| Subjects: | |
| Online Access: | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0100-40422019004700792&lng=en&tlng=en |