Design and Optimization on a Novel High-Performance Ultra-Thin Barrier AlGaN/GaN Power HEMT With Local Charge Compensation Trench

In this paper, a novel, GaN-based high electron mobility transistor (HEMT) using an ultra-thin barrier (UTB) with a local charge compensation trench (LCCT) is designed and optimized. Because the negative plasma-etching process, as well as the relaxing lattice during the process would introduce equiv...

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Bibliographic Details
Main Authors: Zeheng Wang, Zhenwei Zhang, Shengji Wang, Chao Chen, Zirui Wang, Yuanzhe Yao
Format: Article
Language:English
Published: MDPI AG 2019-07-01
Series:Applied Sciences
Subjects:
GaN
Online Access:https://www.mdpi.com/2076-3417/9/15/3054