Graphene Membrane as Suspended Mask for Lithography
Thanks to its excellent mechanical properties, graphene is particularly suited for the realization of suspended membranes. The present paper deals with one possible application of such membranes that is the realization of suspended lithographic masks for shadow evaporation onto a substrate. This tec...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2018-01-01
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| Series: | Journal of Nanomaterials |
| Online Access: | http://dx.doi.org/10.1155/2018/2396593 |