Plasma–Chemical Hybrid NO<sub>x</sub> Removal in Flue Gas from Semiconductor Manufacturing Industries Using a Blade-Dielectric Barrier-Type Plasma Reactor

Plasma–Chemical Hybrid NO<sub>x</sub> Removal in Flue Gas from Semiconductor Manufacturing Industries Using a Blade-Dielectric Barrier-Type Plasma Reactor

NO<sub>x</sub> is emitted in the flue gas from semiconductor manufacturing plants as a byproduct of combustion for abatement of perfluorinated compounds. In order to treat NO<sub>x</sub> emission, a combined process consisting of a dry plasma process using nonthermal plasma a...

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Bibliographic Details
Main Authors: Haruhiko Yamasaki, Yuki Koizumi, Tomoyuki Kuroki, Masaaki Okubo
Format: Article
Language:English
Published: MDPI AG 2019-07-01
Series:Energies
Subjects:
nonthermal plasma
NO<sub>x</sub> reduction
PFC
sodium sulfide
wet scrubber
blade-barrier electrode
semiconductor manufacturing
Online Access:https://www.mdpi.com/1996-1073/12/14/2717

Internet

https://www.mdpi.com/1996-1073/12/14/2717

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