Transverse Beam Profile Analysis of a Plasma Sputter Ion Source

The beam profile of an existing plasma-sputter-type negative ion source with a titanium target is analyzed. The transverse characteristics of the ion beam are investigated and the deposition capability of the system is characterized. The ambient plasma parameters are derived via a Langmuir probe ind...

Full description

Bibliographic Details
Main Authors: Alexander Mendenilla, Carlo Mar Blanca, Henry Ramos
Format: Article
Language:English
Published: University of the Philippines 1998-06-01
Series:Science Diliman
Subjects:
Online Access:http://journals.upd.edu.ph/index.php/sciencediliman/article/view/258