Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN

Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN

Inverse lithography technology (ILT) is intended to achieve optimal mask design to print a lithography target for a given lithography process. Full chip implementation of rigorous inverse lithography remains a challenging task because of enormous computational resource requirements and long computat...

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Bibliographic Details
Main Authors: Xuelong Shi, Yan Yan, Tao Zhou, Xueru Yu, Chen Li, Shoumian Chen, Yuhang Zhao
Format: Article
Language:English
Published: JommPublish 2020-12-01
Series:Journal of Microelectronic Manufacturing
Subjects:
optimal feature maps
inverse lithography technology (ilt)
deep convolution neural network (dcnn)
Online Access:http://www.jommpublish.org/p/63/

Internet

http://www.jommpublish.org/p/63/

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