Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

The rapid development of nanotechnologies and sciences has led to the great demand for novel lithography methods allowing large area, low cost and high resolution nano fabrications. Characterized by unique sub-diffraction optical features like propagation with an ultra-short wavelength and great fie...

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Bibliographic Details
Main Authors: Changtao Wang, Wei Zhang, Zeyu Zhao, Yanqin Wang, Ping Gao, Yunfei Luo, Xiangang Luo
Format: Article
Language:English
Published: MDPI AG 2016-07-01
Series:Micromachines
Subjects:
surface plasmon polaritons
bulk plasmon polaritons
diffraction limit
subwavelength optics
near-field optics
metamaterial
super resolution
nano optical lithography
nanostructure fabrication
Online Access:http://www.mdpi.com/2072-666X/7/7/118

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http://www.mdpi.com/2072-666X/7/7/118

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