Arsenic Exposure and Methylation Efficiency in Relation to Oxidative Stress in Semiconductor Workers
This study examined associations between oxidative stress and arsenic (As) exposure and methylation efficiency in semiconductor workers. An As-exposed group (n = 427) and a control group (n = 91) were included. The As-exposure group (n = 427) included 149 maintenance staff members and 278 production...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-05-01
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| Series: | Atmosphere |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2073-4433/11/5/464 |