Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector

Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector

Fabricating materials with specific refractive indices, which do not naturally exist in the nature, has always been an issue. This paper presents a method for fabricating SiO<sub>x</sub> films with specified refractive index. It is well known that the refractive index of reactively sputt...

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Bibliographic Details
Main Authors: Elnaz Afsharipour, Byoungyoul Park, Cyrus Shafai
Format: Article
Language:English
Published: IEEE 2017-01-01
Series:IEEE Photonics Journal
Subjects:
Distributed Bragg reflector (DBR)
genetic algorithm
optimization
photonic crystals
photonic materials
refractive index of SiO<sub xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">x</sub>.
Online Access:https://ieeexplore.ieee.org/document/7809096/

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https://ieeexplore.ieee.org/document/7809096/

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