Nanohot embossing using curved stage to replicate antireflection nanostructures onto light guide
A nanohot embossing using a curved stage is proposed to improve the replication ratio of nanostructures at near the edge of a thick (sub-mm-order thickness) polymer substrate. The lower replication ratio at near the edge resulting from a conventional hot embossing is due to lower compressive stress,...
| Main Author: | |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Taylor & Francis Group
2007-01-01
|
| Series: | Science and Technology of Advanced Materials |
| Online Access: | http://www.iop.org/EJ/abstract/1468-6996/8/3/A18 |