Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD
In this work, the substrate holders of three principal geometries (flat, pocket, and pedestal) were designed based on E-field simulations. They were fabricated and then tested in microwave plasma-assisted chemical vapor deposition process with the purpose of the homogeneous growth of 100-μm-thick, l...
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doaj-e9e461605fe0444b9888f02380f7c4422020-11-25T02:35:20ZengMDPI AGCoatings2079-64122020-09-011093993910.3390/coatings10100939Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVDVadim Sedov0Artem Martyanov1Alexandr Altakhov2Alexey Popovich3Mikhail Shevchenko4Sergey Savin5Evgeny Zavedeev6Maxim Zanaveskin7Andrey Sinogeykin8Victor Ralchenko9Vitaly Konov10Wonder Technologies LLC, 143026 Moscow, RussiaWonder Technologies LLC, 143026 Moscow, RussiaWonder Technologies LLC, 143026 Moscow, RussiaWonder Technologies LLC, 143026 Moscow, RussiaWonder Technologies LLC, 143026 Moscow, RussiaNanocenter MIREA, MIREA-Russian Technological University, 119454 Moscow, RussiaWonder Technologies LLC, 143026 Moscow, RussiaNational Research Center “Kurchatov Institute”, 123182 Moscow, RussiaWonder Technologies LLC, 143026 Moscow, RussiaProkhorov General Physics Institute of the Russian Academy of Sciences, 119991 Moscow, RussiaWonder Technologies LLC, 143026 Moscow, RussiaIn this work, the substrate holders of three principal geometries (flat, pocket, and pedestal) were designed based on E-field simulations. They were fabricated and then tested in microwave plasma-assisted chemical vapor deposition process with the purpose of the homogeneous growth of 100-μm-thick, low-stress polycrystalline diamond film over 2-inch Si substrates with a thickness of 0.35 mm. The effectiveness of each holder design was estimated by the criteria of the PCD film quality, its homogeneity, stress, and the curvature of the resulting “diamond-on-Si” plates. The structure and phase composition of the synthesized samples were studied with scanning electron microscopy and Raman spectroscopy, the curvature was measured using white light interferometry, and the thermal conductivity was measured using the laser flash technique. The proposed pedestal design of the substrate holder could reduce the stress of the thick PCD film down to 1.1–1.4 GPa, which resulted in an extremely low value of displacement for the resulting “diamond-on-Si” plate of Δh = 50 μm. The obtained results may be used for the improvement of already existing, and the design of the novel-type, MPCVD reactors aimed at the growth of large-area thick homogeneous PCD layers and plates for electronic applications.https://www.mdpi.com/2079-6412/10/10/939polycrystalline diamondCVD synthesismicrowave plasmathermal conductivityheat sinks |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Vadim Sedov Artem Martyanov Alexandr Altakhov Alexey Popovich Mikhail Shevchenko Sergey Savin Evgeny Zavedeev Maxim Zanaveskin Andrey Sinogeykin Victor Ralchenko Vitaly Konov |
spellingShingle |
Vadim Sedov Artem Martyanov Alexandr Altakhov Alexey Popovich Mikhail Shevchenko Sergey Savin Evgeny Zavedeev Maxim Zanaveskin Andrey Sinogeykin Victor Ralchenko Vitaly Konov Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD Coatings polycrystalline diamond CVD synthesis microwave plasma thermal conductivity heat sinks |
author_facet |
Vadim Sedov Artem Martyanov Alexandr Altakhov Alexey Popovich Mikhail Shevchenko Sergey Savin Evgeny Zavedeev Maxim Zanaveskin Andrey Sinogeykin Victor Ralchenko Vitaly Konov |
author_sort |
Vadim Sedov |
title |
Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD |
title_short |
Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD |
title_full |
Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD |
title_fullStr |
Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD |
title_full_unstemmed |
Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD |
title_sort |
effect of substrate holder design on stress and uniformity of large-area polycrystalline diamond films grown by microwave plasma-assisted cvd |
publisher |
MDPI AG |
series |
Coatings |
issn |
2079-6412 |
publishDate |
2020-09-01 |
description |
In this work, the substrate holders of three principal geometries (flat, pocket, and pedestal) were designed based on E-field simulations. They were fabricated and then tested in microwave plasma-assisted chemical vapor deposition process with the purpose of the homogeneous growth of 100-μm-thick, low-stress polycrystalline diamond film over 2-inch Si substrates with a thickness of 0.35 mm. The effectiveness of each holder design was estimated by the criteria of the PCD film quality, its homogeneity, stress, and the curvature of the resulting “diamond-on-Si” plates. The structure and phase composition of the synthesized samples were studied with scanning electron microscopy and Raman spectroscopy, the curvature was measured using white light interferometry, and the thermal conductivity was measured using the laser flash technique. The proposed pedestal design of the substrate holder could reduce the stress of the thick PCD film down to 1.1–1.4 GPa, which resulted in an extremely low value of displacement for the resulting “diamond-on-Si” plate of Δh = 50 μm. The obtained results may be used for the improvement of already existing, and the design of the novel-type, MPCVD reactors aimed at the growth of large-area thick homogeneous PCD layers and plates for electronic applications. |
topic |
polycrystalline diamond CVD synthesis microwave plasma thermal conductivity heat sinks |
url |
https://www.mdpi.com/2079-6412/10/10/939 |
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