Growth of Ultrathin Al<sub>2</sub>O<sub>3</sub> Films on n-InP Substrates as Insulating Layers by RF Magnetron Sputtering and Study on the Optical and Dielectric Properties

Here, we report an explorative study of an attempt to fabricate ultrathin aluminum oxide films on n-InP substrates by radio-frequency (RF) magnetron sputtering as a candidate for insulating layers in semiconductor lasers for optical communication. Film thickness and morphology were monitored to stud...

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Bibliographic Details
Main Authors: Xiufeng Tang, Zhixin Li, Huizhen Liao, Jiong Zhang
Format: Article
Language:English
Published: MDPI AG 2019-05-01
Series:Coatings
Subjects:
Online Access:https://www.mdpi.com/2079-6412/9/5/341