Sheet Resistance Reduction of MoS₂ Film Using Sputtering and Chlorine Plasma Treatment Followed by Sulfur Vapor Annealing

Sheet Resistance Reduction of MoS₂ Film Using Sputtering and Chlorine Plasma Treatment Followed by Sulfur Vapor Annealing

Sheet resistance (R<sub>sheet</sub>) reduction of a-few-layered molybdenum disulfide (MoS<sub>2</sub>) film using sputtering is investigated in this study. To enhance the carrier density, chlorine (Cl2) gas excited by inductively coupled plasma is introduced as a substitute f...

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Bibliographic Details
Main Authors: Takuya Hamada, Shigetaka Tomiya, Tetsuya Tatsumi, Masaya Hamada, Taiga Horiguchi, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi
Format: Article
Language:English
Published: IEEE 2021-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Activation annealing
chlorine plasma
molybdenum disulfide (MoS₂)
radio-frequency magnetron sputtering
transition metal dichalcogenide (TMDC)
Online Access:https://ieeexplore.ieee.org/document/9319671/

Internet

https://ieeexplore.ieee.org/document/9319671/

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