Atomic Layer Deposition of Buffer Layers for the Growth of Vertically Aligned Carbon Nanotube Arrays

Atomic Layer Deposition of Buffer Layers for the Growth of Vertically Aligned Carbon Nanotube Arrays

Abstract Vertically aligned carbon nanotube arrays (VACNTs) show a great potential for various applications, such as thermal interface materials (TIMs). Besides the thermally oxidized SiO2, atomic layer deposition (ALD) was also used to synthesize oxide buffer layers before the deposition of the cat...

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Bibliographic Details
Main Authors: Hao-Hao Li, Guang-Jie Yuan, Bo Shan, Xiao-Xin Zhang, Hong-Ping Ma, Ying-Zhong Tian, Hong-Liang Lu, Johan Liu
Format: Article
Language:English
Published: SpringerOpen 2019-04-01
Series:Nanoscale Research Letters
Subjects:
Atomic layer deposition
Vertically aligned carbon nanotube arrays
Oxide buffer layers
Thermal interface materials
Online Access:http://link.springer.com/article/10.1186/s11671-019-2947-5

Internet

http://link.springer.com/article/10.1186/s11671-019-2947-5

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