Study on the optimization of the deposition rate of planetary GaN-MOCVD films based on CFD simulation and the corresponding surface model

Study on the optimization of the deposition rate of planetary GaN-MOCVD films based on CFD simulation and the corresponding surface model

Metal-organic chemical vapour deposition (MOCVD) is a key technique for fabricating GaN thin film structures for light-emitting and semiconductor laser diodes. Film uniformity is an important index to measure equipment performance and chip processes. This paper introduces a method to improve the qua...

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Bibliographic Details
Main Authors: Jian Li, Ze-yuan Fei, Yi-feng Xu, Jie Wang, Bing-feng Fan, Xue-jin Ma, Gang Wang
Format: Article
Language:English
Published: The Royal Society 2018-01-01
Series:Royal Society Open Science
Subjects:
gallium nitride
metal-organic chemical vapour deposition
numerical simulation
epitaxial growth
deposition rate
response surface methodology method
Online Access:https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.171757

Internet

https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.171757

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