| Summary: | A vibration isolator embedded in precision equipment, such as a scanning electron microscope (SEM), wafer inspection equipment, and nanoimprint lithography equipment, play a critical role in achieving the maximum performance of the equipment during the fabrication of nano/micro-electro-mechanical systems. In this study, the factors that degrade the performance of SEM equipment with isolation devices are classified and discussed, and improvement measures are proposed from the viewpoints of the measured image patterns and vibrations in comparison with the relevant vibration criteria. In particular, this study quantifies the image patterns measured using SEMs, and the results are discussed along with the measured vibration. A guide for the selection of mounting equipment is presented by performing vibration analysis on the lower mount of the dual elastic mount configuration applied to the SEM, as well as the image patterns analyzed with that configuration. In addition, design modifications for the mount and its arrangement are suggested based on impact tests and numerical simulations.
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