Study of thin-film resistor resistance error
A relationship between a thin-film resistor resistance error and mask misalignment with a substrate conductive layer at the second photolithography stage for a thin-film resistor design in which the resistive element does not overlap conductor pads is studied. The error value is at a maximum when th...
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| Format: | Article |
| Language: | English |
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Politehperiodika
2009-10-01
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| Series: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
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| Online Access: | http://www.tkea.com.ua/tkea/2009/5_2009/pdf/12.zip |