Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers

Films with a structure of Ta (5 nm)/Co20Fe60B20 (0.8–1.5 nm)/MgO (1 nm)/Ta (1 nm) were deposited on Corning glass substrates by magnetron sputtering. The as-deposited films with CoFeB layer thickness from 0.8 to 1.3 nm show perpendicular magnetic anisotropy (PMA). After annealing at a proper tempera...

Full description

Bibliographic Details
Main Authors: Yan Liu, Liang Hao, Jiangwei Cao
Format: Article
Language:English
Published: AIP Publishing LLC 2016-04-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4947132