Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers
Films with a structure of Ta (5 nm)/Co20Fe60B20 (0.8–1.5 nm)/MgO (1 nm)/Ta (1 nm) were deposited on Corning glass substrates by magnetron sputtering. The as-deposited films with CoFeB layer thickness from 0.8 to 1.3 nm show perpendicular magnetic anisotropy (PMA). After annealing at a proper tempera...
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Online Access: | http://dx.doi.org/10.1063/1.4947132 |
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doaj-f02e50715e24427ab19785df1cdb71a12020-11-24T21:47:54ZengAIP Publishing LLCAIP Advances2158-32262016-04-0164045008045008-710.1063/1.4947132032604ADVEffect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayersYan Liu0Liang Hao1Jiangwei Cao2School of Information Engineering, Lanzhou University of Finance and Economics, Lanzhou 730020, PR ChinaKey Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, PR ChinaKey Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, PR ChinaFilms with a structure of Ta (5 nm)/Co20Fe60B20 (0.8–1.5 nm)/MgO (1 nm)/Ta (1 nm) were deposited on Corning glass substrates by magnetron sputtering. The as-deposited films with CoFeB layer thickness from 0.8 to 1.3 nm show perpendicular magnetic anisotropy (PMA). After annealing at a proper temperature, the PMA of the films can be enhanced remarkably. A maximum effective anisotropy field of up to 9 kOe was obtained for 1.0- and 1.1-nm-thick CoFeB layers annealed at an optimum temperature of 300 °C. A 4-kOe magnetic field was applied during annealing to study its effect on the PMA of the CoFeB layers. The results confirmed that applying a perpendicular magnetic field during annealing did not improve the maximum PMA of the films, but it did enhance the PMA of the thinner films at a lower annealing temperature.http://dx.doi.org/10.1063/1.4947132 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Yan Liu Liang Hao Jiangwei Cao |
spellingShingle |
Yan Liu Liang Hao Jiangwei Cao Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers AIP Advances |
author_facet |
Yan Liu Liang Hao Jiangwei Cao |
author_sort |
Yan Liu |
title |
Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers |
title_short |
Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers |
title_full |
Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers |
title_fullStr |
Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers |
title_full_unstemmed |
Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers |
title_sort |
effect of annealing conditions on the perpendicular magnetic anisotropy of ta/cofeb/mgo multilayers |
publisher |
AIP Publishing LLC |
series |
AIP Advances |
issn |
2158-3226 |
publishDate |
2016-04-01 |
description |
Films with a structure of Ta (5 nm)/Co20Fe60B20 (0.8–1.5 nm)/MgO (1 nm)/Ta (1 nm) were deposited on Corning glass substrates by magnetron sputtering. The as-deposited films with CoFeB layer thickness from 0.8 to 1.3 nm show perpendicular magnetic anisotropy (PMA). After annealing at a proper temperature, the PMA of the films can be enhanced remarkably. A maximum effective anisotropy field of up to 9 kOe was obtained for 1.0- and 1.1-nm-thick CoFeB layers annealed at an optimum temperature of 300 °C. A 4-kOe magnetic field was applied during annealing to study its effect on the PMA of the CoFeB layers. The results confirmed that applying a perpendicular magnetic field during annealing did not improve the maximum PMA of the films, but it did enhance the PMA of the thinner films at a lower annealing temperature. |
url |
http://dx.doi.org/10.1063/1.4947132 |
work_keys_str_mv |
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