Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes
The microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure the cutoff frequency in a transmission (S<sub>21</sub>) spectrum. For real-time electron density measurement in plasma processing, three different types have been demonstrated: point-type, ring-type...
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doaj-f307b7f7fb924c2e9292686bc70759992020-11-25T02:26:16ZengMDPI AGApplied Sciences2076-34172020-10-01107066706610.3390/app10207066Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff ProbesSi Jun Kim0Jang Jae Lee1Young Seok Lee2Hee Jung Yeom3Hyo Chang Lee4Jung-Hyung Kim5Shin Jae You6Nanotech Optoelectronics Research Center, Yongin Gyonggi Province 16882, KoreaApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, KoreaApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, KoreaKorea Research Institute of Standards and Science, Daejeon 34113, KoreaKorea Research Institute of Standards and Science, Daejeon 34113, KoreaKorea Research Institute of Standards and Science, Daejeon 34113, KoreaApplied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, KoreaThe microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure the cutoff frequency in a transmission (S<sub>21</sub>) spectrum. For real-time electron density measurement in plasma processing, three different types have been demonstrated: point-type, ring-type (RCP), and bar-type (BCP) planar cutoff probes. While Yeom et al. has shown that the RCP and BCP are more suitable than the point-type probe for process monitoring, the basic characteristics of the ring- and bar-type probes have yet to be investigated. The current work includes a computational characterization of a RCP and BCP with various geometrical parameters, as well as a plasma parameter, through a commercial three-dimensional electromagnetic simulation. The parameters of interest include antenna size, antenna distance, dielectric thickness of the transmission line, and input electron density. Simulation results showed that the RCP has several resonance frequencies originating from standing-wave resonance in the S<sub>21</sub> spectrum that the BCP does not. Moreover, the S<sub>21</sub> signal level increased with antenna size and dielectric thickness but decreased with antenna distance. Among the investigated parameters, antenna distance was found to be the most important parameter to improve the accuracy of both RCP and BCP.https://www.mdpi.com/2076-3417/10/20/7066plasma diagnosticselectron density measurementplanar microwave cutoff probebar-type cutoff probering-type cutoff probecomputational characterization |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Si Jun Kim Jang Jae Lee Young Seok Lee Hee Jung Yeom Hyo Chang Lee Jung-Hyung Kim Shin Jae You |
spellingShingle |
Si Jun Kim Jang Jae Lee Young Seok Lee Hee Jung Yeom Hyo Chang Lee Jung-Hyung Kim Shin Jae You Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes Applied Sciences plasma diagnostics electron density measurement planar microwave cutoff probe bar-type cutoff probe ring-type cutoff probe computational characterization |
author_facet |
Si Jun Kim Jang Jae Lee Young Seok Lee Hee Jung Yeom Hyo Chang Lee Jung-Hyung Kim Shin Jae You |
author_sort |
Si Jun Kim |
title |
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes |
title_short |
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes |
title_full |
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes |
title_fullStr |
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes |
title_full_unstemmed |
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes |
title_sort |
computational characterization of microwave planar cutoff probes for non-invasive electron density measurement in low-temperature plasma: ring- and bar-type cutoff probes |
publisher |
MDPI AG |
series |
Applied Sciences |
issn |
2076-3417 |
publishDate |
2020-10-01 |
description |
The microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure the cutoff frequency in a transmission (S<sub>21</sub>) spectrum. For real-time electron density measurement in plasma processing, three different types have been demonstrated: point-type, ring-type (RCP), and bar-type (BCP) planar cutoff probes. While Yeom et al. has shown that the RCP and BCP are more suitable than the point-type probe for process monitoring, the basic characteristics of the ring- and bar-type probes have yet to be investigated. The current work includes a computational characterization of a RCP and BCP with various geometrical parameters, as well as a plasma parameter, through a commercial three-dimensional electromagnetic simulation. The parameters of interest include antenna size, antenna distance, dielectric thickness of the transmission line, and input electron density. Simulation results showed that the RCP has several resonance frequencies originating from standing-wave resonance in the S<sub>21</sub> spectrum that the BCP does not. Moreover, the S<sub>21</sub> signal level increased with antenna size and dielectric thickness but decreased with antenna distance. Among the investigated parameters, antenna distance was found to be the most important parameter to improve the accuracy of both RCP and BCP. |
topic |
plasma diagnostics electron density measurement planar microwave cutoff probe bar-type cutoff probe ring-type cutoff probe computational characterization |
url |
https://www.mdpi.com/2076-3417/10/20/7066 |
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