Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment

Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment

To improve the thermal and mechanical stability of SiCf/SiC or C/SiC composites with SiBN interphase, SiBN coating was deposited by low pressure chemical vapor deposition (LPCVD) using SiCl4-BCl3-NH3-H2-Ar gas system. The effect of the SiCl4 flow rate on deposition kinetics was investigated. Results...

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Bibliographic Details
Main Authors: Jianping Li, Hailong Qin, Yongsheng Liu, Fang Ye, Zan Li, Laifei Cheng, Litong Zhang
Format: Article
Language:English
Published: MDPI AG 2017-06-01
Series:Materials
Subjects:
SiBN coating
low pressure chemical vapor deposition
SiCl4 flow
deposition mechanism
Online Access:http://www.mdpi.com/1996-1944/10/6/627

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http://www.mdpi.com/1996-1944/10/6/627

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