Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography
Focusing technique is the key factor in improving the resolution of projection lithography. In order to achieve high accuracy of focusing on the nanometer level, we present a focusing method based on dual-channel light intensity modulation. Two superposed grating fringes are formed with a phase diff...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2016-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/7362105/ |