Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography
Focusing technique is the key factor in improving the resolution of projection lithography. In order to achieve high accuracy of focusing on the nanometer level, we present a focusing method based on dual-channel light intensity modulation. Two superposed grating fringes are formed with a phase diff...
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doaj-f38dcb134e264b13985d60daeb139fb72021-03-29T17:29:35ZengIEEEIEEE Photonics Journal1943-06552016-01-01811810.1109/JPHOT.2015.25084197362105Dual-Channel Light Intensity Modulation Method for Focusing in Projection LithographyYanli Li0Wei Yan1Song Hu2JinHua Feng3Jian Wang4State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, ChinaState Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, ChinaState Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, ChinaState Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, ChinaState Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, ChinaFocusing technique is the key factor in improving the resolution of projection lithography. In order to achieve high accuracy of focusing on the nanometer level, we present a focusing method based on dual-channel light intensity modulation. Two superposed grating fringes are formed with a phase difference of π/2. The shift of the wafer can be resolved by the phase variation of corresponding fringes. The conventional focusing method with light intensity modulation is influenced by disturbing effects such as fluctuations of the light intensity and stray light. These adverse factors are overcome by the signal ratio of two channels with the same optical components. The focusing accuracy in our experiments is ±8 nm.https://ieeexplore.ieee.org/document/7362105/Focusinggratingslithographyfringe analysis |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Yanli Li Wei Yan Song Hu JinHua Feng Jian Wang |
spellingShingle |
Yanli Li Wei Yan Song Hu JinHua Feng Jian Wang Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography IEEE Photonics Journal Focusing gratings lithography fringe analysis |
author_facet |
Yanli Li Wei Yan Song Hu JinHua Feng Jian Wang |
author_sort |
Yanli Li |
title |
Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography |
title_short |
Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography |
title_full |
Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography |
title_fullStr |
Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography |
title_full_unstemmed |
Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography |
title_sort |
dual-channel light intensity modulation method for focusing in projection lithography |
publisher |
IEEE |
series |
IEEE Photonics Journal |
issn |
1943-0655 |
publishDate |
2016-01-01 |
description |
Focusing technique is the key factor in improving the resolution of projection lithography. In order to achieve high accuracy of focusing on the nanometer level, we present a focusing method based on dual-channel light intensity modulation. Two superposed grating fringes are formed with a phase difference of π/2. The shift of the wafer can be resolved by the phase variation of corresponding fringes. The conventional focusing method with light intensity modulation is influenced by disturbing effects such as fluctuations of the light intensity and stray light. These adverse factors are overcome by the signal ratio of two channels with the same optical components. The focusing accuracy in our experiments is ±8 nm. |
topic |
Focusing gratings lithography fringe analysis |
url |
https://ieeexplore.ieee.org/document/7362105/ |
work_keys_str_mv |
AT yanlili dualchannellightintensitymodulationmethodforfocusinginprojectionlithography AT weiyan dualchannellightintensitymodulationmethodforfocusinginprojectionlithography AT songhu dualchannellightintensitymodulationmethodforfocusinginprojectionlithography AT jinhuafeng dualchannellightintensitymodulationmethodforfocusinginprojectionlithography AT jianwang dualchannellightintensitymodulationmethodforfocusinginprojectionlithography |
_version_ |
1724197794370027520 |