Modelling of EUV light sources based on microwave discharge in inhomogeneous flow of nonequilibrium plasma with multiply charged tin and xenon ions
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2018-01-01
|
| Series: | EPJ Web of Conferences |
| Online Access: | https://doi.org/10.1051/epjconf/201818701001 |