High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular...

Full description

Bibliographic Details
Main Authors: Kahraman Keskinbora, Umut Tunca Sanli, Margarita Baluktsian, Corinne Grévent, Markus Weigand, Gisela Schütz
Format: Article
Language:English
Published: Beilstein-Institut 2018-07-01
Series:Beilstein Journal of Nanotechnology
Subjects:
extreme ultraviolet (EUV) radiation
focused ion beam (FIB)
Fresnel zone plate
ion beam lithography (IBL)
nanopatterning
soft X-rays
Online Access:https://doi.org/10.3762/bjnano.9.194

Internet

https://doi.org/10.3762/bjnano.9.194

Similar Items