Nanotextured Shrink Wrap Superhydrophobic Surfaces by Argon Plasma Etching

We present a rapid, simple, and scalable approach to achieve superhydrophobic (SH) substrates directly in commodity shrink wrap film utilizing Argon (Ar) plasma. Ar plasma treatment creates a stiff skin layer on the surface of the shrink film. When the film shrinks, the mismatch in stiffness between...

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Bibliographic Details
Main Authors: Jolie M. Nokes, Himanshu Sharma, Roger Tu, Monica Y. Kim, Michael Chu, Ali Siddiqui, Michelle Khine
Format: Article
Language:English
Published: MDPI AG 2016-03-01
Series:Materials
Subjects:
Online Access:http://www.mdpi.com/1996-1944/9/3/196