Impact of parameter variation in fabrication of nanostructure by atomic force microscopy nanolithography.

Impact of parameter variation in fabrication of nanostructure by atomic force microscopy nanolithography.

In this letter, we investigate the fabrication of Silicon nanostructure patterned on lightly doped (10(15) cm(-3)) p-type silicon-on-insulator by atomic force microscope nanolithography technique. The local anodic oxidation followed by two wet etching steps, potassium hydroxide etching for silicon r...

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Bibliographic Details
Main Authors: Arash Dehzangi, Farhad Larki, Sabar D Hutagalung, Mahmood Goodarz Naseri, Burhanuddin Y Majlis, Manizheh Navasery, Norihan Abdul Hamid, Mimiwaty Mohd Noor
Format: Article
Language:English
Published: Public Library of Science (PLoS) 2013-01-01
Series:PLoS ONE
Online Access:http://europepmc.org/articles/PMC3679133?pdf=render

Internet

http://europepmc.org/articles/PMC3679133?pdf=render

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