Microstructural Characterization and Formation Mechanism of Nitrided Layers on Aluminum Substrates by Thermal Plasma Nitriding
Nitrided layers on 6082 aluminum alloy substrates and 1060 aluminum substrates are formed at atmospheric pressure using thermal nitrogen plasma, which only takes seconds to form a millimeter-level layer. The nitrided layers are composed of aluminum nitride (AlN) and aluminum solid solution phases. M...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2019-05-01
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| Series: | Metals |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2075-4701/9/5/523 |