Thickness dependent chemical and microstructural properties of DC reactive magnetron sputtered titanium nitride thin films on low carbon steel cross-section

Polished samples of low carbon steel (LCS) rod cross-sections were sputtered with different thicknesses of TiNx thin film using DC reactive magnetron sputtering technique. While other process parameters such as target power (200 W), substrate position (150 mm) and sputtering pressure (1.33 Pa) were...

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Bibliographic Details
Main Authors: Emmanuel Ajenifuja, Abimbola Patricia I. Popoola, Olawale M. Popoola
Format: Article
Language:English
Published: Elsevier 2019-01-01
Series:Journal of Materials Research and Technology
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785417306683