Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films
State-of-the-art techniques for the fabrication of compound semiconductors are mostly vacuum-based physical vapor or chemical vapor deposition processes. These vacuum-based techniques typically operate at high temperatures and normally require higher capital costs. Solution-based techniques offer o...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2014-05-01
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| Series: | Processes |
| Subjects: | |
| Online Access: | http://www.mdpi.com/2227-9717/2/2/441 |