Reactive Sputter Deposition of NiCrxOy Films Using NiCr Target
<p>In this paper an original numerical model, based on the standard Berg model, was used to simulate the growth mechanism of NiCr<sub>x</sub>O<sub>y</sub> deposited with changing oxygen flow during reactive sputter deposition. The effect of oxygen flow rate on the disch...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Kaunas University of Technology
2016-05-01
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| Series: | Medžiagotyra |
| Subjects: | |
| Online Access: | http://matsc.ktu.lt/index.php/MatSc/article/view/8563 |