Fabrication of Nanopillar Crystalline ITO Thin Films with High Transmittance and IR Reflectance by RF Magnetron Sputtering

Fabrication of Nanopillar Crystalline ITO Thin Films with High Transmittance and IR Reflectance by RF Magnetron Sputtering

Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin...

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Bibliographic Details
Main Authors: Ling Dong, Guisheng Zhu, Huarui Xu, Xupeng Jiang, Xiuyun Zhang, Yunyun Zhao, Dongliang Yan, Le Yuan, Aibing Yu
Format: Article
Language:English
Published: MDPI AG 2019-03-01
Series:Materials
Subjects:
indium tin oxide thin film
RF magnetron sputtering
nanopillar crystalline
transmittance
IR reflectance
Online Access:https://www.mdpi.com/1996-1944/12/6/958

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https://www.mdpi.com/1996-1944/12/6/958

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