Effect of size and position of gold nanocrystals embedded in gate oxide of SiO2/Si MOS structures

The influence of single and double layered gold (Au) nanocrystals (NC), embedded in SiO2 matrix, on the electrical characteristics of metal–oxide–semiconductor (MOS) structures is reported in this communication. The size and position of the NCs are varied and study is made using Sentaurus TCAD simul...

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Bibliographic Details
Main Authors: Chaitali Chakraborty, Chayanika Bose
Format: Article
Language:English
Published: World Scientific Publishing 2016-03-01
Series:Journal of Advanced Dielectrics
Subjects:
MOS
Online Access:http://www.worldscientific.com/doi/pdf/10.1142/S2010135X16500016