Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films

The present study reports on the fabrication of porous zinc oxide by wet chemical etching. ZnO thin films were deposited via radio-frequency magnetron sputtering on p-type silicon with (111) preferred orientation. The etchants used in the present work were 0.1% and 1.0% nitric acid (HNO3) solutions....

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Bibliographic Details
Main Authors: C.G., Ching (Author), Leonard, Lu (Author), C.I., Ang (Author), P.K., Ooi (Author), S.S., Ng (Author), Z., Hassan (Author), H., Abu Hassan (Author)
Format: Article
Language:English
Published: Universiti Kebangsaan Malaysia, 2013-09.
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