High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit an...
| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group,
2016-01-18T23:01:20Z.
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| Subjects: | |
| Online Access: | Get fulltext |