Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity
In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000 nm. At the visible range of the spectrum, fr...
| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
American Vacuum Society,
2018-11-14T19:46:55Z.
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| Subjects: | |
| Online Access: | Get fulltext |