Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam

Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam

The controlled nanoscale patterning of 2D materials is a promising approach for engineering the optoelectronic, thermal, and mechanical properties of these materials to achieve novel functionalities and devices. Herein, high-resolution patterning of hexagonal boron nitride (h-BN) is demonstrated via...

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Main Authors: Lopez, Josue Jacob (Author), Kong, Jing (Author), Ambrosio, Antonio (Author), Dai, Siyuan (Author), Huynh, Chuong (Author), Eyhusen, Soeren (Author), Bell, David C. (Author), Lin, Xiao (Author), Rivera, Nicholas H. (Author), Ma, Qiong (Author), Kaminer, Ido Efraim (Author), Jarillo-Herrero, Pablo (Author), Soljacic, Marin (Author), Huang, Shengxi (Author), Watanabe, Kenji (Author), Taniguchi, Takashi (Author), Basov, Dimitri N. (Author)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Department of Physics (Contributor), Massachusetts Institute of Technology. Research Laboratory of Electronics (Contributor)
Format: Article
Language:English
Published: Wiley, 2019-06-27T18:37:44Z.
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