Grayscale stencil lithography for patterning multispectral color filters
© 2020 Optical Society of America Flat optics for spatially resolved amplitude and phase modulation usually rely on 2D patterning of layered structures with spatial thickness variation. For example, Fabry-Perot-type multilayer structures have been applied widely as spectral filter arrays. However, i...
Main Authors: | Li, Xinhao (Author), Tan, Zheng Jie (Author), Fang, Nicholas X (Author) |
---|---|
Other Authors: | Massachusetts Institute of Technology. Department of Mechanical Engineering (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor) |
Format: | Article |
Language: | English |
Published: |
The Optical Society,
2021-12-20T23:49:01Z.
|
Subjects: | |
Online Access: | Get fulltext |
Similar Items
-
Low-cost method to fabricate nanoscale stencil for Nano-Stencil Lithography
by: Si-SiangWang, et al.
Published: (2015) -
Stencil Lithography for Scalable Micro- and Nanomanufacturing
by: Ke Du, et al.
Published: (2017-04-01) -
Development of Nano-Stencil Lithography and its Application
by: Meng-CheTsai, et al.
Published: (2014) -
Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography
by: Juergen Brugger, et al.
Published: (2013-10-01) -
APPLICATIONS OF UV-LIGA AND GRAYSCALE LITHOGRAPHY FOR DISPLAY TECHNOLOGIES
by: I. V. Timoshkov, et al.
Published: (2019-12-01)