Electron-beam Directed Materials Assembly
We have developed a processing method that employs direct surface imaging of a surface-modified silicon wafer to define a chemical nanopattern that directs material assembly, eliminating most of the traditional processing steps. Defining areas of high and low surface energy by selective alkylsiloxan...
Main Authors: | , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
SPIE,
2010-09-21T12:41:10Z.
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Subjects: | |
Online Access: | Get fulltext |