Electron-beam Directed Materials Assembly

We have developed a processing method that employs direct surface imaging of a surface-modified silicon wafer to define a chemical nanopattern that directs material assembly, eliminating most of the traditional processing steps. Defining areas of high and low surface energy by selective alkylsiloxan...

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Bibliographic Details
Main Authors: Fedynyshyn, Theodore H. (Contributor), Kingsborough, Richard P. (Contributor), Goodman, Russell B. (Contributor), Astolfi, David K. (Contributor)
Other Authors: Lincoln Laboratory (Contributor)
Format: Article
Language:English
Published: SPIE, 2010-09-21T12:41:10Z.
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