Photonic Device Layout Within the Foundry CMOS Design Environment
A design methodology to layout photonic devices within standard electronic complementary metal-oxide-semiconductor (CMOS) foundry data preparation flows is described. This platform has enabled the fabrication of designs in three foundry scaled-CMOS processes from two semiconductor manufacturers.
Main Authors: | , |
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Other Authors: | , |
Format: | Article |
Language: | English |
Published: |
Institute of Electrical and Electronics Engineers,
2011-03-21T21:17:21Z.
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Subjects: | |
Online Access: | Get fulltext |
Summary: | A design methodology to layout photonic devices within standard electronic complementary metal-oxide-semiconductor (CMOS) foundry data preparation flows is described. This platform has enabled the fabrication of designs in three foundry scaled-CMOS processes from two semiconductor manufacturers. United States. Defense Advanced Research Projects Agency (DARPA) National Science Foundation (U.S.) |
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