Determination of substrate pinning in epitaxial and supported graphene layers via Raman scattering

• Main Authors: Ferralis, Nicola (Contributor), Maboudian, Roya (Author), Carraro, Carlo (Author)
• Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor)
• Format: Article
• Language: English
• Published: American Physical Society, 2011-05-19T13:31:11Z.
• Subjects: Article
• Online Access: Get fulltext

The temperature-induced shift of the Raman G line in epitaxial graphene on SiC and Ni surfaces, as well as in graphene supported on SiO[subscript 2], is investigated with Raman spectroscopy. The thermal shift rate of epitaxial graphene on 6H-SiC(0001) is found to be about three times that of freestanding graphene. This result is explained quantitatively as a consequence of pinning by the substrate. In contrast, graphene grown on polycrystalline Ni films is shown to be unpinned, i.e., to behave elastically as freestanding, despite the relatively strong interaction with the metal substrate. Moreover, it is shown that the transfer of exfoliated graphene layers onto a supporting substrate can result in pinned or unpinned layers, depending on the transfer protocol.
National Science Foundation (U.S.) (EEC-0832819)
National Science Foundation (U.S.) (CMMI-0825531)
United States. Defense Advanced Research Projects Agency (DARPA). Microsystems Technology Office