Determination of substrate pinning in epitaxial and supported graphene layers via Raman scattering

The temperature-induced shift of the Raman G line in epitaxial graphene on SiC and Ni surfaces, as well as in graphene supported on SiO[subscript 2], is investigated with Raman spectroscopy. The thermal shift rate of epitaxial graphene on 6H-SiC(0001) is found to be about three times that of freesta...

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Bibliographic Details
Main Authors: Ferralis, Nicola (Contributor), Maboudian, Roya (Author), Carraro, Carlo (Author)
Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor)
Format: Article
Language:English
Published: American Physical Society, 2011-05-19T13:31:11Z.
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Online Access:Get fulltext
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100 1 0 |a Ferralis, Nicola  |e author 
100 1 0 |a Massachusetts Institute of Technology. Department of Materials Science and Engineering  |e contributor 
100 1 0 |a Ferralis, Nicola  |e contributor 
100 1 0 |a Ferralis, Nicola  |e contributor 
700 1 0 |a Maboudian, Roya  |e author 
700 1 0 |a Carraro, Carlo  |e author 
245 0 0 |a Determination of substrate pinning in epitaxial and supported graphene layers via Raman scattering 
260 |b American Physical Society,   |c 2011-05-19T13:31:11Z. 
856 |z Get fulltext  |u http://hdl.handle.net/1721.1/62841 
520 |a The temperature-induced shift of the Raman G line in epitaxial graphene on SiC and Ni surfaces, as well as in graphene supported on SiO[subscript 2], is investigated with Raman spectroscopy. The thermal shift rate of epitaxial graphene on 6H-SiC(0001) is found to be about three times that of freestanding graphene. This result is explained quantitatively as a consequence of pinning by the substrate. In contrast, graphene grown on polycrystalline Ni films is shown to be unpinned, i.e., to behave elastically as freestanding, despite the relatively strong interaction with the metal substrate. Moreover, it is shown that the transfer of exfoliated graphene layers onto a supporting substrate can result in pinned or unpinned layers, depending on the transfer protocol. 
520 |a National Science Foundation (U.S.) (EEC-0832819) 
520 |a National Science Foundation (U.S.) (CMMI-0825531) 
520 |a United States. Defense Advanced Research Projects Agency (DARPA). Microsystems Technology Office 
546 |a en_US 
655 7 |a Article 
773 |t Physical Review B