Loop flattening & spherical sampling: Highly efficient model reduction techniques for SRAM yield analysis

The impact of process variation in deep-submicron technologies is especially pronounced for SRAM architectures which must meet demands for higher density and higher performance at increased levels of integration. Due to the complex structure of SRAM, estimating the effect of process variation accura...

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Bibliographic Details
Main Authors: Qazi, Masood (Contributor), Tikeka, Mehul (Author), Dolecek, Lara (Author), Shah, Devavrat (Contributor), Chandrakasan, Anantha P. (Contributor)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Microsystems Technology Laboratories (Contributor)
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineers, 2011-05-25T18:11:41Z.
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