Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules
By saturating a photochromic transition with a nodal illumination (wavelength, λ), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this...
| Main Authors: | , , , |
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| Other Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
American Physical Society (APS),
2012-03-23T17:30:18Z.
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| Subjects: | |
| Online Access: | Get fulltext |