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69842 |
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|a Brimhall, Nicole
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|a Massachusetts Institute of Technology. Department of Chemistry
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|a Massachusetts Institute of Technology. Research Laboratory of Electronics
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|a Andrew, Trisha Lionel
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|a Andrew, Trisha Lionel
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|a Manthena, Rajakumar Varma
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|a Menon, Rajesh
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|a Andrew, Trisha Lionel
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|a Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules
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|b American Physical Society (APS),
|c 2012-03-23T17:30:18Z.
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|z Get fulltext
|u http://hdl.handle.net/1721.1/69842
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|a By saturating a photochromic transition with a nodal illumination (wavelength, λ), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this approach and a two-beam interferometer, we demonstrate isolated lines as narrow as λ/8 (78 nm) and spacing between features as narrow as λ/4 (153 nm). This is considerably smaller than the minimum far-field diffraction limit of λ/2. Most significantly, nanopatterning is achieved via single-photon reactions and at low light levels, which in turn allow for high throughput.
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|a Utah Science Technology and Research (USTAR) Initiative
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|a United States. Defense Advanced Research Projects Agency (Contract No. N66001-10-1-4065)
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|a National Science Foundation (U.S.)
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|a Article
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|t Physical Review Letters
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