Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules
By saturating a photochromic transition with a nodal illumination (wavelength, λ), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this...
Main Authors: | Brimhall, Nicole (Author), Manthena, Rajakumar Varma (Author), Menon, Rajesh (Author), Andrew, Trisha Lionel (Contributor) |
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Other Authors: | Massachusetts Institute of Technology. Department of Chemistry (Contributor), Massachusetts Institute of Technology. Research Laboratory of Electronics (Contributor) |
Format: | Article |
Language: | English |
Published: |
American Physical Society (APS),
2012-03-23T17:30:18Z.
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Subjects: | |
Online Access: | Get fulltext |
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