Low emissivity high-temperature tantalum thin film coatings for silicon devices

Low emissivity high-temperature tantalum thin film coatings for silicon devices

The authors study the use of thin ( ∼ 230 nm) tantalum (Ta) layers on silicon (Si) as a low emissivity (high reflectivity) coating for high-temperature Si devices. Such coatings are critical to reduce parasitic radiation loss, which is one of the dominant loss mechanisms at high temperatures (above...

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Bibliographic Details
Main Authors: Rinnerbauer, Veronika (Contributor), Senkevich, Jay (Contributor), Soljacic, Marin (Contributor), Joannopoulos, John (Author), Celanovic, Ivan L. (Author)
Other Authors: Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Contributor), Massachusetts Institute of Technology. Department of Physics (Contributor), Massachusetts Institute of Technology. Research Laboratory of Electronics (Contributor), Joannopoulos, John D. (Contributor), Celanovic, Ivan (Contributor)
Format: Article
Language:English
Published: American Vacuum Society (AVS), 2013-02-15T15:40:40Z.
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