Thermal conductivity of silicon nanowire arrays with controlled roughness

Thermal conductivity of silicon nanowire arrays with controlled roughness

A two-step metal assisted chemical etching technique is used to systematically vary the sidewall roughness of Si nanowires in vertically aligned arrays. The thermal conductivities of nanowire arrays are studied using time domain thermoreflectance and compared to their high-resolution transmission el...

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Bibliographic Details
Main Authors: Feser, Joseph P. (Author), Sadhu, Jyothi S. (Author), Azeredo, Bruno P. (Author), Hsu, Keng H. (Author), Ma, Jun (Author), Kim, Junhwan (Author), Seong, Myunghoon (Author), Fang, Nicholas Xuanlai (Contributor), Li, Xiuling (Author), Ferreira, Placid M. (Author), Sinha, Sanjiv (Author), Cahill, David G. (Author)
Other Authors: Massachusetts Institute of Technology. Department of Mechanical Engineering (Contributor)
Format: Article
Language:English
Published: American Institute of Physics (AIP), 2013-04-26T17:44:50Z.
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