Kinetic Monte Carlo simulations of nanocrystalline film deposition

A full diffusion kinetic Monte Carlo algorithm is used to model nanocrystalline film deposition, and study the mechanisms of grain nucleation and microstructure formation in such films. The major finding of this work is that new grain nucleation occurs predominantly on surface peaks. Consequently, d...

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Bibliographic Details
Main Authors: Ruan, Shiyun (Contributor), Schuh, Christopher A (Author)
Other Authors: Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor), Schuh, Christopher A. (Contributor)
Format: Article
Language:English
Published: American Institute of Physics (AIP), 2013-08-05T16:17:02Z.
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